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Fundamentals of semiconductor fabrication / Gary S. May, Simon M. Sze.

By: May, Gary S.
Contributor(s): Sze, Simon M, 1936-.
Material type: TextTextPublisher: New York : John Wiley & Sons, c2004Description: xiii, 305 p. : ill. ; 26 cm.ISBN: 981253072X; 0471232793; 9780471232797.Subject(s): Semiconductors -- Design and construction | Integrated circuits -- Design and constructionDDC classification: 621.38152 Online resources: WorldCat details | Ebook Fulltext
Contents:
Table of contents 1. Introduction -- 2. Crystal growth -- 3. Silicon oxidation -- 4. Photolithography -- 5. Etching -- 6. Diffusion -- 7. Ion implantation -- 8. Film deposition -- 9. Process integration -- 10. IC manufacturing -- 11. Future trends and challenges -- Appendixes: -- A. List of symbols -- B. International system of units (SI units) -- C. Unit prefixes -- D. Greek alphabet -- E. Physical constants -- F. Properties of Si and GaAs at 300K -- G. Some properties of the error function -- H. Basic kinetic theory of gases -- I. SUPREM commands -- J. Running PROLITH -- K. Percentage points of the t distribution -- L. Percentage points of the F distribution.
Summary: Summary: From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical Read more...
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Non-fiction 621.38152 MAF 2004 (Browse shelf) Not for loan
Text Text EWU Library
Reserve Section
Non-fiction 621.38152 MAF 2004 (Browse shelf) C-1 Not For Loan 20387
Text Text EWU Library
Circulation Section
Non-fiction 621.38152 MAF 2004 (Browse shelf) C-2 Available 20388
Text Text EWU Library
Circulation Section
Non-fiction 621.38152 MAF 2004 (Browse shelf) C-3 Available 20389
Text Text EWU Library
Circulation Section
Non-fiction 621.38152 MAF 2004 (Browse shelf) C-4 Available 20390
Text Text EWU Library
Circulation Section
Non-fiction 621.38152 MAF 2004 (Browse shelf) C-5 Available 20391

Semiconductor Processing & Fabrication

Total holds: 0

Includes bibliographical references and index.

Table of contents 1. Introduction --
2. Crystal growth --
3. Silicon oxidation --
4. Photolithography --
5. Etching --
6. Diffusion --
7. Ion implantation --
8. Film deposition --
9. Process integration --
10. IC manufacturing --
11. Future trends and challenges --
Appendixes: --
A. List of symbols --
B. International system of units (SI units) --
C. Unit prefixes --
D. Greek alphabet --
E. Physical constants --
F. Properties of Si and GaAs at 300K --
G. Some properties of the error function --
H. Basic kinetic theory of gases --
I. SUPREM commands --
J. Running PROLITH --
K. Percentage points of the t distribution --
L. Percentage points of the F distribution.

Summary:
From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical Read more...

Electrical & Electronic Engineering

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