Fundamentals of semiconductor fabrication / Gary S. May, Simon M. Sze.

By: May, Gary S Contributor(s): Sze, Simon M, 1936-Material type: Text

TextLanguage: English Publication details: New York : John Wiley & Sons, c2004. Description: xiii, 305 p. : ill. ; 26 cmISBN: 981253072X; 0471232793; 9780471232797Subject(s): Semiconductors -- Design and construction | Integrated circuits -- Design and constructionDDC classification: 621.38152 LOC classification: TK7871.85 | .M378 2004Online resources: WorldCat details | Ebook Fulltext

Contents:

TOC 1. Introduction -- 2. Crystal growth -- 3. Silicon oxidation -- 4. Photolithography -- 5. Etching -- 6. Diffusion -- 7. Ion implantation -- 8. Film deposition -- 9. Process integration -- 10. IC manufacturing -- 11. Future trends and challenges -- Appendixes: -- A. List of symbols -- B. International system of units (SI units) -- C. Unit prefixes -- D. Greek alphabet -- E. Physical constants -- F. Properties of Si and GaAs at 300K -- G. Some properties of the error function -- H. Basic kinetic theory of gases -- I. SUPREM commands -- J. Running PROLITH -- K. Percentage points of the t distribution -- L. Percentage points of the F distribution.

Summary: Summary: From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical Read more...

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Holdings
Item type	Current library	Collection	Call number	Copy number	Status	Barcode	Course reserves
E-Book	EWU Library E-book	Non-fiction	621.38152 MAF 2004 (Browse shelf(Opens below))		Not for loan
Text	EWU Library Reserve Section	Non-fiction	621.38152 MAF 2004 (Browse shelf(Opens below))	C-1	Not For Loan	20387
Text	EWU Library Circulation Section	Non-fiction	621.38152 MAF 2004 (Browse shelf(Opens below))	C-2	Available	20388
Text	EWU Library Circulation Section	Non-fiction	621.38152 MAF 2004 (Browse shelf(Opens below))	C-3	Available	20389
Text	EWU Library Circulation Section	Non-fiction	621.38152 MAF 2004 (Browse shelf(Opens below))	C-4	Available	20390
Text	EWU Library Circulation Section	Non-fiction	621.38152 MAF 2004 (Browse shelf(Opens below))	C-5	Available	20391	Semiconductor Processing & Fabrication

Total holds: 0

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Previous	621.3815 RIT Transistor circuit techniques :	621.3815 TOT 1994 Schaum's outline of theory and problems of digital principles /	621.3815 TRA 2006 Transistor level modeling for analog/RF IC design /	621.38152 MAF 2004 Fundamentals of semiconductor fabrication /	621.3815284 FUN 2010 Fundamentals of III-V semiconductor MOSFETs /	621.3815284 MAS 2007 Strained-Si heterostructure field effect devices /	621.381531 BRI 2003 Signal integrity issues and printed circuit board design /	Next

Includes bibliographical references and index.

TOC 1. Introduction --
2. Crystal growth --
3. Silicon oxidation --
4. Photolithography --
5. Etching --
6. Diffusion --
7. Ion implantation --
8. Film deposition --
9. Process integration --
10. IC manufacturing --
11. Future trends and challenges --
Appendixes: --
A. List of symbols --
B. International system of units (SI units) --
C. Unit prefixes --
D. Greek alphabet --
E. Physical constants --
F. Properties of Si and GaAs at 300K --
G. Some properties of the error function --
H. Basic kinetic theory of gases --
I. SUPREM commands --
J. Running PROLITH --
K. Percentage points of the t distribution --
L. Percentage points of the F distribution.

Summary:
From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical Read more...

EEE

Saifun Momota

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