May, Gary S.

Fundamentals of semiconductor fabrication / Gary S. May, Simon M. Sze. - New York : John Wiley & Sons, c2004. - xiii, 305 p. : ill. ; 26 cm.

Includes bibliographical references and index.

1. Introduction --
2. Crystal growth --
3. Silicon oxidation --
4. Photolithography --
5. Etching --
6. Diffusion --
7. Ion implantation --
8. Film deposition --
9. Process integration --
10. IC manufacturing --
11. Future trends and challenges --
Appendixes: --
A. List of symbols --
B. International system of units (SI units) --
C. Unit prefixes --
D. Greek alphabet --
E. Physical constants --
F. Properties of Si and GaAs at 300K --
G. Some properties of the error function --
H. Basic kinetic theory of gases --
I. SUPREM commands --
J. Running PROLITH --
K. Percentage points of the t distribution --
L. Percentage points of the F distribution. Table of contents

Summary:
From crystal growth to integrated devices and circuits, this new book offers a basic, up-to-date introduction to semiconductor fabrication technology, including both the theoretical and practical Read more...




981253072X 0471232793 9780471232797

2003276248


Semiconductors--Design and construction.
Integrated circuits--Design and construction.

TK7871.85 / .M378 2004

621.38152 / MAF 2004

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